The Photovoltaic Scribing Machine integrates dual laser technology for precise patterning and engraving of photovoltaic substrates in research, development, and production environments.

Key Features

• Self-developed dual laser system with integrated wavelength capabilities compatible with the entire P1-P3 scribing process
• Processing compatibility with battery cells ranging from 100-300mm in width
• Ultra-precision scribing with accuracy of ≤±10μm/m and line spacing capabilities as narrow as ≥5μm
• Adjustable line width from 20-100μm with exceptional stability (≤±2% variation)
• Minimal thermal impact (<2μm) with high-precision marking straightness (±3μm) and repeatability (±5μm)
• Planar motion straightness of ±3μm/300mm for consistent processing across larger substrates
• Integrated red/green light capability enabling complete P1P2P3 scribing operations on a single machine

Key Technical Specifications

Compatibility and Standards

• Electrical Certification: GB. Optional conversion of this equipment to UL/CE standards - contact Diagon for details
• Control Systems: Standard Omron series. Optional control system migration (Siemens, Rockwell/Allen-Bradley, others) to match your existing infrastructure - contact Diagon for compatibility assessment